J4 ›› 2014, Vol. 41 ›› Issue (5): 135-140.doi: 10.3969/j.issn.1001-2400.2014.05.023

• 研究论文 • 上一篇    下一篇

非晶硅薄膜晶体管关态电流的物理模型

恩云飞1,2;刘远2;何玉娟2;师谦2;郝跃1   

  1. (1. 西安电子科技大学 微电子学院,陕西 西安  710071;
    2. 工业和信息化部电子第五研究所 电子元器件可靠性物理及其应用技术重点实验室,广东 广州  510610)
  • 收稿日期:2013-05-17 出版日期:2014-10-20 发布日期:2014-11-27
  • 通讯作者: 恩云飞
  • 作者简介:恩云飞(1968-),女,研究员,E-mail: Enyf@ceprei.com.
  • 基金资助:

    国家自然科学基金资助项目(61204112);中国博士后科学基金资助项目(2012M521628)

Physical model for the off current in amorphous silicon thin film transistors

EN Yunfei1,2;LIU Yuan2;HE Yujuan2;SHI Qian2;HAO Yue1   

  1. (1. School of Microelectronic, Xidian Univ., Xi'an  710071, China;
    2. China Electronic Product Reliability and Environmental Testing Research Institute, Guangzhou  510610, China)
  • Received:2013-05-17 Online:2014-10-20 Published:2014-11-27
  • Contact: EN Yunfei

摘要:

基于器件有源层内纵向电场变化模型,提出了背沟界面能带弯曲量与栅源电压的近似方程,并针对背沟电子传导机制建立器件反向亚阈电流模型;基于空穴的一维连续性方程,提出有源层内空穴逃逸率的物理模型,并针对前沟空穴传导机制建立器件泄漏电流模型.实验结果验证了所提关态电流物理模型的准确性,曲线拟合良好.

关键词: 非晶硅, 薄膜晶体管, 关态电流, 泄漏电流, 反向亚阈电流

Abstract:

A physical model for the off current in amorphous silicon thin film transistors is proposed. Firstly, an approximation for the band bending in the back interface as a function of the gate-source voltage is derived in the reverse subthreshold region, and then a current model due to electron conduction in the back channel is developed by considering the deep states. Secondly, a rate used to describe the escaping possibility of holes in the bulk a-Si:H layer is proposed based on the one-dimensional continuity equation. By considering the hole generation rate in the drain depletion region and the hole escaping rate in the bulk a-Si:H layer, a leakage current model due to hole conduction in the front channel is developed. The proposed model has been verified using the experimental data.

Key words: amorphous silicon, thin film transistors, off current, leakage current, reverse subthreshold current

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